Dislocation reduction in GaN layer by introducing GaN-rich GaNP intermediate layers.
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- Tsukihara Masashi
- Department of Electrical and Electronic Engineering, The University of Tokushima
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- Naoi Yoshiki
- Department of Electrical and Electronic Engineering, The University of Tokushima
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- Li Hongdong
- Satellite Venture Business Laboratory, The University of Tokushima
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- Sakai Shiro
- Department of Electrical and Electronic Engineering, The University of Tokushima
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説明
We report a new method of reducing the dislocation density in a GaN epilayer grown on sapphire by metalorganic chemical vapor deposition (MOCVD), by introducing GaN-rich-GaNP/GaN multiple layers (MLs) during the growth of the GaN layer. It is found that some threading dislocations bend and/or terminate near the ML region, which would suppress the dislocations propagating to the top film surface. The dislocation density in the films consequently decreases to 6×108 cm−2 in the GaN epilayer with GaNP/GaN MLs, which is a decrease of factor 2 with respect to that in a conventionally grown GaN epilayer. It is considered that the ternary GaN-rich GaNP selectively deposits in the regions of those dislocation-induced pits on the as-grown GaN surface, and then influences the propagation properties of the dislocations. This method can be applied to many devices such as laser diodes whose performance is deteriorated by dislocations.
収録刊行物
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- Japanese Journal of Applied Physics
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Japanese Journal of Applied Physics 42 (4A), 1514-1516, 2003
The Japan Society of Applied Physics
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詳細情報 詳細情報について
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- CRID
- 1390282681232981504
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- NII論文ID
- 130004530599
- 10010799401
- 210000053108
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- NII書誌ID
- AA10457675
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- ISSN
- 13474065
- 00214922
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- NDL書誌ID
- 6507650
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- 本文言語コード
- en
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- データソース種別
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- JaLC
- NDL
- Crossref
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- 抄録ライセンスフラグ
- 使用不可