Giant Vesicle Fusion on Microelectrodes Fabricated by Femtosecond Laser Ablation Followed by Synchrotron Radiation Etching
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- Rahman Md. Mashiur
- The Graduate University for Advanced Studies
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- Nonogaki Youichi
- The Graduate University for Advanced Studies Institute for Molecular Science
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- Tero Ryugo
- Institute for Molecular Science
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- Kim Yong-Hoon
- The Graduate University for Advanced Studies
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- Uno Hidetaka
- Institute for Molecular Science
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- Zhang Zheng-Long
- The Graduate University for Advanced Studies
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- Yano Takayuki
- Institute for Molecular Science
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- Aoyama Masaki
- Institute for Molecular Science
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- Sasaki Ryuichiro
- AISIN SEIKI Co., Ltd.
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- Nagai Hiroyuki
- AISIN SEIKI Co., Ltd.
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- Yoshida Makoto
- AISIN SEIKI Co., Ltd.
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- Urisu Tsuneo
- The Graduate University for Advanced Studies Institute for Molecular Science
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Description
We have developed a new technique for fabricating a hole (well) with a diameter of about 1 μm for a microelectrode on the surface of SiO2 (600 nm)/CoSi2 (10 nm)/Si substrate. This process enabled the fabrication of electrode holes while maintaining the original nanolevel flatness (Ra∼0.8 nm) of the SiO2 surface. A lipid bilayer was formed by giant vesicle fusion on these microelectrodes. Fluorescence microscope, in situ atomic force microscope and electrical characteristics measurements showed that a single lipid bilayer of sufficiently high resistance (gigaohm seal) was successfully fabricated.
Journal
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- Japanese Journal of Applied Physics
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Japanese Journal of Applied Physics 44 (37-41), L1207-L1210, 2005
The Japan Society of Applied Physics
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Details 詳細情報について
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- CRID
- 1390282681241066752
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- NII Article ID
- 40006899707
- 130004533549
- 210000059323
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- NII Book ID
- AA11906093
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- ISSN
- 13474065
- 00214922
- http://id.crossref.org/issn/13474065
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- NDL BIB ID
- 7470335
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- Text Lang
- en
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- Data Source
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- JaLC
- NDL
- Crossref
- CiNii Articles
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- Abstract License Flag
- Disallowed