Giant Vesicle Fusion on Microelectrodes Fabricated by Femtosecond Laser Ablation Followed by Synchrotron Radiation Etching

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We have developed a new technique for fabricating a hole (well) with a diameter of about 1 μm for a microelectrode on the surface of SiO2 (600 nm)/CoSi2 (10 nm)/Si substrate. This process enabled the fabrication of electrode holes while maintaining the original nanolevel flatness (Ra∼0.8 nm) of the SiO2 surface. A lipid bilayer was formed by giant vesicle fusion on these microelectrodes. Fluorescence microscope, in situ atomic force microscope and electrical characteristics measurements showed that a single lipid bilayer of sufficiently high resistance (gigaohm seal) was successfully fabricated.

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