Pulsed Laser Deposition of Ferroelectric (Na<sub>0.5</sub>K<sub>0.5</sub>)NbO<sub>3</sub>-Based Thin Films
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- Saito Takehisa
- Department of Materials Chemistry, Ryukoku University
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- Adachi Harumi
- Department of Materials Chemistry, Ryukoku University
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- Wada Takahiro
- Department of Materials Chemistry, Ryukoku University
書誌事項
- タイトル別名
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- Pulsed Laser Deposition of Ferroelectric (Na0.5K0.5)NbO3-Based Thin Films
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説明
Ferroelectric (Na0.52K0.44Li0.04)(Nb0.84Ta0.10Sb0.06)O3 thin films were epitaxially grown on a (100)SrRuO3||(100)SrTiO3 substrate by pulsed laser deposition. Crystallographic analysis of the film was performed using conventional X-ray diffraction analysis and rocking curve measurements. High resolution X-ray diffraction reciprocal space map was also measured to analyze the crystallographic relationship between the grown film and the SrTiO3 substrate and to determine the strain state of the film. The full width at half maximum of the rocking curve was as small as 0.19° and the determined pseudo-tetragonal lattice parameters were a=3.947 Å and c=3.955 Å. The P–E hysteresis loop of the film was characteristic of ferroelectric behavior.
収録刊行物
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- Japanese Journal of Applied Physics
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Japanese Journal of Applied Physics 44 (16-19), L573-L575, 2005
The Japan Society of Applied Physics
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詳細情報 詳細情報について
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- CRID
- 1390282681243255680
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- NII論文ID
- 10015726476
- 210000059586
- 130004533041
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- NII書誌ID
- AA10650595
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- ISSN
- 13474065
- 00214922
- http://id.crossref.org/issn/13474065
- http://id.crossref.org/issn/00214922
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- NDL書誌ID
- 7309744
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- 本文言語コード
- en
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- データソース種別
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- JaLC
- NDLサーチ
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- CiNii Articles
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- 使用不可