書誌事項
- タイトル別名
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- Preparation and Optical Properties of Bismuth Titanate Films by ECR Plasma Sputtering.
- ECR プラズマ スパッタリングホウ ニ ヨル チタンサン ビスマス マク ノ
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Bi-Ti-O oxide thin films were prepared on a sapphire single crystal substrate by electron cyclotron resonance (ECR) plasma sputtering. The target used was a sintered Bi4Ti3O12(BIT). The temperature of substrate (Tsub) was controlled in the range from room temperature to 640°C. The film obtained at Tsub=500°C was mixture of pyrochlore type oxide(Bi2Ti2O7) and Bi4Ti3O12 oxide. In the film formed at 640°C, the (001) plane of the Bi4Ti3O12 grew parallel to the (1120) and (1102) planes of the sapphire substrate, and the (104) plane of Bi4Ti3O12 grew parallel to the (0001) plane of the sapphire substrate. The deposition rate was about 200Å/min. Transmittance and refractive index of the Films were measured.
収録刊行物
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- 粉体および粉末冶金
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粉体および粉末冶金 39 (2), 109-112, 1992
一般社団法人 粉体粉末冶金協会
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詳細情報 詳細情報について
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- CRID
- 1390282681280901376
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- NII論文ID
- 130000818091
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- NII書誌ID
- AN00222724
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- ISSN
- 18809014
- 05328799
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- NDL書誌ID
- 3756465
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- 本文言語コード
- ja
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- データソース種別
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- JaLC
- NDL
- Crossref
- CiNii Articles
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- 抄録ライセンスフラグ
- 使用不可