Fabrication and Plasma Treatment of Carbon Nanotubes on Sputtered Cobalt for Electrodes of Electrochemical Capacitors

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  • LIN Chuen-Chang
    Department of Chemical & Materials Engineering, National Yunlin University of Science and Technology
  • LIAO Jing-Yuan
    Department of Chemical & Materials Engineering, National Yunlin University of Science and Technology

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A cobalt (catalyst) is sputtered at different time levels on graphite foil on which carbon nanotubes are subsequently directly grown by chemical vapor deposition (CVD). Next, carbon nanotubes are modified by RF (radio frequency) oxygen-plasma at different volume flow rates of oxygen and then immersed in nitric acid solution. The longer Co sputtering time led to the thicker Co film thickness. Higher specific capacitance of 140.2 F g−1 is obtained under a certain condition (Co sputtering time=15 min and flow rate of oxygen=30 cm3 min−1). This shows good specific capacitance. Furthermore, the higher flow rate of oxygen caused the higher carbonyl functional group (C=O), thus leading to higher specific capacitance.

収録刊行物

  • Electrochemistry

    Electrochemistry 79 (1), 10-14, 2011

    公益社団法人　電気化学会

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