書誌事項
- タイトル別名
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- The Adsorption Mechanism of 6-Diallylamino-1,3,5-triazine-2,4-dithiol on Iron Surfaces by Conventional Vacuum Deposition.
抄録
Films of 6-diallylamino-1, 3, 5-triazine-2, 4-dithiol (DA) were formed on iron substrates by the conventional vacuum deposition method. haracteristics of adsorbed DA were investigated using ellipsometry, FTIR-RAS, and XPS to examine the influence of substrates on adsorbed water. The ion substrates were washed with acetone (unbaked substrates), and baked under an ultra high vacuum condition to remove adsorbed water (baked substrates). The results showed that DA mlecules easily adsorbed chemically on the unbaked substrate, by the formation of disulfide, sulfur-carbon, and mercaptide bonds. The reactions of DA on the surface would be predominated by a free radical process. This mechanism was proposed to be originated by radical generation by molecular collision with DA to hydrous ferric oxide (FeOOH) surfaces.
収録刊行物
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- 高分子論文集
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高分子論文集 60 (3), 108-114, 2003
公益社団法人 高分子学会
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詳細情報 詳細情報について
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- CRID
- 1390282681498787712
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- NII論文ID
- 130004035595
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- ISSN
- 18815685
- 03862186
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- 本文言語コード
- ja
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- データソース種別
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- JaLC
- Crossref
- CiNii Articles
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- 抄録ライセンスフラグ
- 使用不可