Relation between Drawing Stress and Structural Development of High Molecular Weight Nylon 6.
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- TAJIMA Kazushige
- Department of Chemistry, Tokyo University of Science
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- KANAMOTO Tetsuo
- Department of Applied Chemistry, Tokyo University of Science
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- ITO Masayoshi
- Department of Chemistry, Tokyo University of Science
Bibliographic Information
- Other Title
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- 静的融点以上における高分子量ナイロン6の延伸応力と構造発現の関係
Description
Films of high molecular weight Nylon 6 (I.V. =8.6-11.3 dL/g) were uniaxially drawn by a tensile force at 240°C, above the static melting temperature (>220°C) of the undrawn sample. Relations between drawing stress (δd) and structural development in the resultant drawn films were evaluated mainly by WAXD measurements and tensile tests. Both α and γ-crystals were formed in the drawn samples. The fraction of the α-crystals in the crystalline phases was dependent on the δd, the higher the δd, the higher was the fraction of α-crystals, leading to the increase of tensile modulus. In this work, the maximum of the δd was about 3.5 MPa. In this case, the fraction of the α-crystals in the crystalline phase was about 0.75. The fraction was increased further by a heat treatment under the high stress. By the annealing of the drawn samples, a part of the oriented amorphous chains and γ-crystals were transformed into α-crystals. As a result, the tensile modulus was increased up to 18.6 GPa.
Journal
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- KOBUNSHI RONBUNSHU
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KOBUNSHI RONBUNSHU 61 (6), 346-351, 2004
The Society of Polymer Science, Japan
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Keywords
Details 詳細情報について
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- CRID
- 1390282681500865536
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- NII Article ID
- 130004035669
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- ISSN
- 18815685
- 03862186
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- Text Lang
- ja
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- Data Source
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- JaLC
- Crossref
- CiNii Articles
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- Abstract License Flag
- Disallowed