Estimation of the Activation Energy of Resist Removal Using Wet Ozone
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- GOTO Yousuke
- Kanazawa Institute of Technology
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- FUNASAKA Tomohiro
- Kanazawa Institute of Technology
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- YAMAMOTO Masashi
- Kanazawa Institute of Technology
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- KOIKE Kunihiko
- Iwatani R&D Center, Iwatani Corporation
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- HORIBE Hideo
- Kanazawa Institute of Technology
Bibliographic Information
- Other Title
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- 湿潤オゾンを用いたレジスト除去反応の活性化エネルギー評価
- シツジュン オゾン オ モチイタ レジスト ジョキョ ハンノウ ノ カッセイカ エネルギー ヒョウカ
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Abstract
Using environmentally friendly wet ozone instead of conventional chemicals, we removed positive-tone novolak resists. In the wet ozone process, resists are decomposed and removed through ozonolysis of the resists and the hydrolysis of the ozonolysis products. It was revealed that the temperature difference (= “wet ozone temperature” – “substrate temperature”), to control water requirements for the hydrolysis strongly influences the resist removal rate. The activation energy of the removal reaction of this process was estimated to be 28.0 kJ/mol. The activation energy is 10~20 kJ/mol lower than that of the commonly-used ashing process, therefore the resist can be removed at a higher rate and at a lower temperature.
Journal
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- KOBUNSHI RONBUNSHU
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KOBUNSHI RONBUNSHU 70 (6), 295-299, 2013
The Society of Polymer Science, Japan
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Details 詳細情報について
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- CRID
- 1390282681501042304
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- NII Article ID
- 10031182217
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- NII Book ID
- AN00085011
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- COI
- 1:CAS:528:DC%2BC3sXhtFCnsrjL
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- ISSN
- 18815685
- 03862186
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- NDL BIB ID
- 024767907
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- Text Lang
- ja
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- Data Source
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- JaLC
- NDL
- Crossref
- CiNii Articles
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- Abstract License Flag
- Disallowed