表面レリーフ型ホログラムの複製

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書誌事項

タイトル別名
  • Replication of a Surface Relief Hologram
  • ヒョウメン レリーフガタ ホログラム ノ フクセイ

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説明

Increase in sensitivity and improvement of linearity for the photoresist hologram by the postexposure method are analytically studied. It becomes clear that the experimental values agree with the theoretical one approximately.<BR>Besides, the characteristics of the replica hologram by embossing method is experimentally studied.<BR>In this result, it is found that the replica hologram is copied perfectly even in deep grooves.

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