Development of three-dimensional nanotechnology using focused ion beam

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  • MATSUI Shinji
    Himeji Institute of Technology, LASTI CREST JST Japan Science and Technology Company

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  • 集束イオンビームによる三次元ナノテクノロジーの展開
  • シュウソク イオンビーム ニ ヨル 3ジゲン ナノテクノロジー ノ テンカイ

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Abstract

<p>Three-dimensional (3D) nanostructure fabrication using focused ion beam chemical vapor deposition (FIB-CVD) has the following advantages.　(1) Because the beam diameter of FIB is 5 nm, 3D nanostructures with a few ten nanometers can be fabricated using FIB.　(2) 3D nanostrucures made of metal, semiconductor, and insulator can be fabricated using various source gases.　Three-dimensional nanotechnology using FIB can be widely applied to electronics, mechanics, optics, and biology.　We have demonstrated the fabrication of free-space nanowiring, electrostatic nanoactuator, bioinjector, and electrostatic nanomanipulator using FIB.</p>

Journal

  • Oyo Buturi

    Oyo Buturi 73 (4), 445-454, 2004-04-10

    The Japan Society of Applied Physics

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