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Growth and characterization of semiconducting iron disilicide bulk crystals
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- UDONO Haruhiko
- Department of Electrical and Electronic Engineering, College of Engineering, Ibaraki University
Bibliographic Information
- Other Title
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- 半導体鉄シリサイドの結晶成長と基礎物性
- ハンドウタイ テツ シリサイド ノ ケッショウ セイチョウ ト キソ ブッセイ
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Description
<p>The semiconducting iron disilicide β-FeSi2 is increasingly attracting attention as a suitable material for Si-based optoelectronics, because its film is epitaxially grown on a Si substrate using a conventional Si-ULSI process. However, investigations on the fundamental properties of β-FeSi2 are limited so far. In this paper, we report the solution growth of β-FeSi2 bulk single crystals and their electrical, optical and structural properties.</p>
Journal
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- Oyo Buturi
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Oyo Buturi 76 (7), 790-793, 2007-07-10
The Japan Society of Applied Physics
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Details 詳細情報について
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- CRID
- 1390282752337307904
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- NII Article ID
- 10019516862
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- NII Book ID
- AN00026679
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- ISSN
- 21882290
- 03698009
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- NDL BIB ID
- 8882971
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- Text Lang
- ja
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- Data Source
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- JaLC
- NDL Search
- CiNii Articles
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- Abstract License Flag
- Disallowed