Development of Dry-nano-polishing Technique using Reactive Ion Etching for Ultra Thin Titanium Wafer
-
- Chino Teruya
- Graduate School of Science and Technology, Niigata University
-
- Watanabe Yuta
- Graduate School of Science and Technology, Niigata University
-
- Tsukiyama Yosuke
- Graduate School of Science and Technology, Niigata University
-
- Sohgawa Masayuki
- Graduate School of Science and Technology, Niigata University
-
- Abe Takashi
- Graduate School of Science and Technology, Niigata University
Bibliographic Information
- Other Title
-
- 反応性イオンエッチングを用いた極薄チタンウェハのドライナノ研磨技術の開発
- ハンノウセイ イオンエッチング オ モチイタ ゴクウス チタンウェハ ノ ドライナノ ケンマ ギジュツ ノ カイハツ
- Development of dry‐nano‐polishing technique using reactive ion etching for ultra thin titanium wafer
Search this article
Description
<p>In this study, we developed a dry-nano-polishing technique using reactive ion etching for ultra thin titanium wafer. The surface of titanium coated with photoresist is polished by reactive ion etching using SF6/C4F8 gas. Etching speed of titanium and photoresist were adjusted to close to each other by changing temperature and ratio of SF6/C4F8 gas. By etching titanium under these conditions, the smooth surface shape of the resist was transferred to titanium. By combining with photolithography, it is possible to polish a specific part.</p>
Journal
-
- IEEJ Transactions on Sensors and Micromachines
-
IEEJ Transactions on Sensors and Micromachines 141 (4), 103-107, 2021-04-01
The Institute of Electrical Engineers of Japan
- Tweet
Details 詳細情報について
-
- CRID
- 1390287540627223808
-
- NII Article ID
- 210000167015
- 130008014048
-
- NII Book ID
- AN1052634X
-
- ISSN
- 13475525
- 19429541
- 13418939
- 19429533
-
- NDL BIB ID
- 031391004
-
- Text Lang
- ja
-
- Article Type
- journal article
-
- Data Source
-
- JaLC
- NDL Search
- Crossref
- CiNii Articles
- KAKEN
- OpenAIRE
-
- Abstract License Flag
- Disallowed
