Film Deposition by Controlling Plasma-induced Surface Reactions

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  • プラズマが誘起する表面反応の制御による膜作製

Abstract

<p>A lot of kinds of reactive chemical species generated in plasma contribute to the film deposition, so that the films can be deposited at low temperatures and many types of films can be deposited. Controlling Plasma-induces Surface Reactions will be the key of the future film deposition, as well as the control of plasma. State-of-art studies in this field will be introduced.</p>

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