Edge Quality Control of an Optical Racetrack Resonator by Character Projection/Variable-shaped Beam Method to Optimize Pattern Approximation in F7000S-VD02

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  • Higo Akio
    Systems Design Lab, School of Engineering, The University of Tokyo
  • Sawamura Tomoki
    School of Engineering, The University of Tokyo
  • Fujiwara Makoto
    Systems Design Lab, School of Engineering, The University of Tokyo
  • Lebrasseur Eric
    Systems Design Lab, School of Engineering, The University of Tokyo
  • Mizushima Ayako
    School of Engineering, The University of Tokyo
  • Ota Etsuko
    Systems Design Lab, School of Engineering, The University of Tokyo
  • Ochiai Yukinori
    Systems Design Lab, School of Engineering, The University of Tokyo
  • Arakawa Taro
    Graduate School of Engineering, Yokohama National University
  • Mita Yoshio
    Systems Design Lab, School of Engineering, The University of Tokyo School of Engineering, The University of Tokyo

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<p>Character Projection (CP) method and variable-shaped beam (VSB) are very unique and powerful drawing methods for high-throughput electron Beam (EB) lithography system. These methods have much interests to the industries due to the wafer scale exposure capability and time effective in the order of magnitude. However, the tradeoff of the exposure quality according to the EB exposure pattern approximation methods has not yet been comprehensively studied. Our study is essential for photonics because target patterns are curbed waveguide. We propose 100 nm octangular CP sleeving methods with several overlap parameters for the optical racetrack resonator test structure. Two approximation techniques were tried such as 100 nm octagonal CP and fine variable-shaped rectangles. Optical measurement clearly revealed quality differences between these methods, and this method is very useful for the curved structure and time effective technique.</p>

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