AP-MOCVD deposition of CuO thin films (2)
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- Fujiwara Kazuki
- Shibaura Inst.
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- Teramura Mizuki
- Shibaura Inst.
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- Taguch Kentaro
- Shibaura Inst.
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- Taniguch Kai
- Shibaura Inst.
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- Sakai Syungo
- Shibaura Inst.
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- Ishikawa Hiroyasu
- Shibaura Inst. SIT Center for GI
Bibliographic Information
- Other Title
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- 常圧MOCVD法によるCuO薄膜の作製 (2)
Journal
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- JSAP Annual Meetings Extended Abstracts
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JSAP Annual Meetings Extended Abstracts 2016.1 (0), 3980-3980, 2016-03-03
The Japan Society of Applied Physics
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Keywords
Details 詳細情報について
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- CRID
- 1390576922112476544
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- ISSN
- 24367613
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- Text Lang
- ja
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- Data Source
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- JaLC