Effects of Oxygen-Gas-Flow Rates and Ga Contents on Structural Properties of Ga-Doped ZnO Films Prepared by Reactive Plasma Deposition with a DC Arc Discharge
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- Terasako Tomoaki
- Grad. School Sci. & Eng., Ehime Univ.
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- Nomoto Junichi
- Research Inst., Kochi Univ. Technol.
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- Makino Hisao
- Research Inst., Kochi Univ. Technol.
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- Shirakata Sho
- Grad. School Sci. & Eng., Ehime Univ.
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- Yamamoto Tetsuya
- Research Inst., Kochi Univ. Technol.
Bibliographic Information
- Other Title
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- 反応性プラズマ蒸着法によって作製したGa添加ZnO薄膜における構造特性への酸素ガス流量及びGa添加量の効果
Journal
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- JSAP Annual Meetings Extended Abstracts
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JSAP Annual Meetings Extended Abstracts 2015.1 (0), 3826-3826, 2015-02-26
The Japan Society of Applied Physics
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Keywords
Details 詳細情報について
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- CRID
- 1390577541501865088
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- ISSN
- 24367613
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- Text Lang
- ja
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- Data Source
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- JaLC
