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HfO<sub>2</sub>/Si構造における界面層作成手法の検討

DOI

飯田恭朗

農工大工
鬼木悠丞

農工大工
岩崎好孝

農工大工
上野智雄

農工大工

Journal

JSAP Annual Meetings Extended Abstracts

JSAP Annual Meetings Extended Abstracts 2012.1 (0), 2953-2953, 2012-02-29

The Japan Society of Applied Physics

Keywords

17p-A4-5

Details 詳細情報について

CRID

1390579599233152000
DOI

10.11470/jsapmeeting.2012.1.0_2953
ISSN

24367613
Text Lang

ja
Data Source
- JaLC

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