Preparation of the TiO2 Electrode for Artificial Photosynthesis by the Sputtering Method

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  • スパッタリング法による人工光合成用酸化チタン電極の合成
  • スパッタリングホウ ニ ヨル ジンコウ コウゴウセイヨウ サンカ チタン デンキョク ノ ゴウセイ

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Abstract

We prepared the TiO2 thin film electrodes for artificial photosynthesis by using the RF magnetronsputtering method. The TiO2 thin films deposited on MgO, LaAlO3, Al2O3, LaSrAlTaO and SrTiO3 single crystalsubstrates had an anatase, rutile and brookite crystal structures. We found that the crystal structure of TiO2 thinfilms depends on deposition conditions, such as total sputtering pressure, substrate materials and crystal planes ofsubstrate surface.

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