低出力大気溶射装置を用いて作製したTiO2皮膜のDSSCへの応用

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  • Application of TiO2 Film Deposited by Low Power Atmospheric Plasma Spray Equipment to DSSC
  • テイシュツリョク タイキ ヨウシャ ソウチ オ モチイテ サクセイ シタ TiO ₂ ヒマク ノ DSSC エ ノ オウヨウ

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In order to develop a dye-sensitized solar cell (DSSC) manufacturing process using low power atmospheric plasma spray (APS), porous TiO2 film deposition was performed by the developed low power APS equipment. Consequently, the porosity and Anatase/ rutile ratio of the TiO2 film increased with increasing spray distance. The DSSC included the deposited film as photo voltaic device generated higher open circuit voltage with increasing the spray distance: d. The open circuit voltage of the DSSC with the porosity of 26.5% was 241 mV at d= 220 mm. Besides, the DSSC included the porous TiO2 film of 18% porosity using NaCl powder addition of the feedstock TiO2, generated high open circuit voltage of 105 mV in comparison with that in case of pure TiO2 feed stock powder deposited at d= 100 mm. From these results, these techniques were proved to have high potential for deposition of porous TiO2 film for the photo voltaic device of the DSSC.

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