Ferroelectric properties of room temperature-deposited (Al<sub>1-<i>x</i></sub>Sc<i><sub>x</sub></i>)N films by the sputtering method.
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- Yasuoka Shinnosuke
- Tokyo Tech.
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- Shimizu Takao
- Tokyo Tech. NIMS
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- Uehara Masato
- AIST
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- Yamada Hiroshi
- AIST
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- Akiyama Morito
- AIST
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- Funakubo Hiroshi
- Tokyo Tech.
Bibliographic Information
- Other Title
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- スパッタリング法で室温合成した(Al<sub>1-<i>x</i></sub>Sc<i><sub>x</sub></i>)N膜の強誘電性評価
Journal
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- JSAP Annual Meetings Extended Abstracts
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JSAP Annual Meetings Extended Abstracts 2020.2 (0), 886-886, 2020-08-26
The Japan Society of Applied Physics
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Keywords
Details 詳細情報について
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- CRID
- 1390854882571591936
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- ISSN
- 24367613
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- Text Lang
- ja
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- Data Source
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- JaLC
