Non-destructive Characterization of Oxide/Ge Interface by Photoluminescence Measurement
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- Kabuyanagi Shoichi
- Tokyo Univ. JST-CREST
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- Nishimura Tomonori
- Tokyo Univ. JST-CREST
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- Yajima Takeaki
- Tokyo Univ. JST-CREST
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- Toriumi Akira
- Tokyo Univ. JST-CREST
Bibliographic Information
- Other Title
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- フォトルミネッセンス測定を用いた絶縁膜/Ge界面の非破壊評価
Journal
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- JSAP Annual Meetings Extended Abstracts
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JSAP Annual Meetings Extended Abstracts 2015.1 (0), 2962-2962, 2015-02-26
The Japan Society of Applied Physics
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Details 詳細情報について
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- CRID
- 1390859016477980032
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- ISSN
- 24367613
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- Text Lang
- ja
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- Data Source
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- JaLC