Polish uniformity for Si and SiO<sub>2</sub> using a minimal CMP machine
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- Umeyama Norio
- MINIMAL
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- Shibuya Kazutaka
- MINIMAL Fujikoshi Machinery
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- Nakamura Yoshio
- MINIMAL Fujikoshi Machinery
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- Ichikawa Kouichiro
- Fujikoshi Machinery
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- Khumpuang Sommawan
- MINIMAL AIST
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- Hara Shiro
- MINIMAL AIST
Bibliographic Information
- Other Title
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- ミニマルCMP装置によるSi及びSiO<sub>2</sub>膜研磨の面内均一性
Journal
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- JSAP Annual Meetings Extended Abstracts
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JSAP Annual Meetings Extended Abstracts 2014.1 (0), 2794-2794, 2014-03-03
The Japan Society of Applied Physics
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Keywords
Details 詳細情報について
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- CRID
- 1390859635833397888
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- ISSN
- 24367613
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- Text Lang
- ja
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- Data Source
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- JaLC