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Origin of Anisotropic Electrical Properties of 4H-SiC Trench Metal-Oxide-Semiconductor Field-Effect Transistors on Off-Axis Substrates
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Journal
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- Japanese journal of applied physics : JJAP
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Japanese journal of applied physics : JJAP 51 (11), 2012-11
Tokyo : The Japan Society of Applied Physics
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Details 詳細情報について
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- CRID
- 1520009409166630784
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- NII Article ID
- 40019495917
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- NII Book ID
- AA12295836
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- ISSN
- 00214922
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- NDL BIB ID
- 024102710
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- Text Lang
- en
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- NDL Source Classification
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- ZM35(科学技術--物理学)
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- Data Source
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- NDL Search
- CiNii Articles