Invited Fabrication of Sub-100nm Linewidth Grating Patterns Using Nanoimprint Lithography

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Invited Fabrication of Sub 100nm Linewidth Grating Patterns Using Nanoimprint Lithography
2004 Asia-Pacific Workshop on Fundamentals and Application of Advanced Semiconductor Devices(AWAD 2004) ; Session A8 Nano-Lithography
2004 Asia Pacific Workshop on Fundamentals and Application of Advanced Semiconductor Devices AWAD 2004 ; Session A8 Nano Lithography

電子情報通信学会技術研究報告 = IEICE technical report : 信学技報

電子情報通信学会技術研究報告 = IEICE technical report : 信学技報 104 (154), 9-12, 2004-07-02

東京 : 電子情報通信学会