Resolution, line-edge roughness, sensitivity tradeoff, and quantum yield of high photo acid generator resists for extreme ultraviolet lithography

DOI Web Site 11 Citations 25 References

Bibliographic Information

Other Title

Resolution line edge roughness sensitivity tradeoff and quantum yield of high photo acid generator resists for extreme ultraviolet lithography

Japanese journal of applied physics : JJAP

Japanese journal of applied physics : JJAP 50 (3), 036504-, 2011-03

Tokyo : The Japan Society of Applied Physics

CRID

1520290883298492928
NII Article ID

40018777933
NII Book ID

AA12295836
ISSN

00214922

13474065

http://id.crossref.org/issn/13474065
DOI

10.7567/jjap.50.036504
NDL BIB ID

11054662
Web Site

http://id.ndl.go.jp/bib/11054662

https://ndlsearch.ndl.go.jp/books/R000000004-I11054662
Text Lang

en
NDL Source Classification
- ZM35(科学技術--物理学)
Data Source
- NDL
- Crossref
- CiNii Articles