Synergy effect of particle radiation and ultraviolet radiation from capacitively coupled radio frequency argon plasmas on n-GaN etching damage

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  • Synergy effect of particle radiation and ultraviolet radiation from capacitively coupled radio frequency argon plasmas on n GaN etching damage
  • Special issue: Dry process
  • Special issue Dry process

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コレクション : 国立国会図書館デジタルコレクション > デジタル化資料 > 雑誌

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