Invited FEOL Process for Sub-100nm DRAM
Bibliographic Information
- Other Title
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- Invited FEOL Process for Sub 100nm DRAM
- AWAD2002(Asia-Pacific Workshop on Fundamental and Application of Advanced Semiconductor Devices)
- AWAD 2002 Asia Pacific Workshop on Fundamental and Application of Advanced Semiconductor Devices
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Journal
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- 電子情報通信学会技術研究報告 = IEICE technical report : 信学技報
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電子情報通信学会技術研究報告 = IEICE technical report : 信学技報 102 (175), 1-4, 2002-07-01
東京 : 電子情報通信学会
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Details 詳細情報について
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- CRID
- 1520290884050021248
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- NII Article ID
- 110003311423
- 110004027015
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- NII Book ID
- AA1123312X
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- ISSN
- 09135685
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- Text Lang
- en
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- NDL Source Classification
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- ZN33(科学技術--電気工学・電気機械工業--電子工学・電気通信)
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- Data Source
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- NDL
- CiNii Articles