Effect of plasma gases on insulating properties of low-temperature-deposited SiOCH films prepared by remote plasma-enhanced chemical vapor deposition
Bibliographic Information
- Other Title
-
- Effect of plasma gases on insulating properties of low temperature deposited SiOCH films prepared by remote plasma enhanced chemical vapor deposition
- Special issue: Solid state devices and materials
- Special issue Solid state devices and materials
Search this article
Journal
-
- Japanese journal of applied physics. Part. 1, Regular papers, brief communications & review papers : JJAP
-
Japanese journal of applied physics. Part. 1, Regular papers, brief communications & review papers : JJAP 46 (4B), 1997-2000, 2007-04
Tokyo : Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physics
- Tweet
Keywords
Details 詳細情報について
-
- CRID
- 1520572357058749568
-
- NII Article ID
- 40015348976
-
- NII Book ID
- AA10457675
-
- ISSN
- 00214922
- 13474065
-
- NDL BIB ID
- 8718588
-
- Text Lang
- en
-
- NDL Source Classification
-
- ZM35(科学技術--物理学)
-
- Data Source
-
- NDL
- Crossref
- CiNii Articles
