Microcrystalline/amorphous thin Si films deposition by a newly developed dual injection system employing hydrogen plasma and silicon radicals at low temperature (300℃) chemical vapor deposition process

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Microcrystalline amorphous thin Si films deposition by a newly developed dual injection system employing hydrogen plasma and silicon radicals at low temperature 300ドC chemical vapor deposition process
Special issue: Solid state devices and materials
Special issue Solid state devices and materials

Japanese journal of applied physics. Part. 1, Regular papers, brief communications & review papers : JJAP

Japanese journal of applied physics. Part. 1, Regular papers, brief communications & review papers : JJAP 46 (4B), 2542-2553, 2007-04

Tokyo : Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physics

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