Quantitative Estimation of the Metal-Induced Negative Oxide Charge Density in n-Type Silicon Wafers from Measurements of Frequency-Dependent AC Surface Photovoltage

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Quantitative Estimation of the Metal Induced Negative Oxide Charge Density in n Type Silicon Wafers from Measurements of Frequency Dependent AC Surface Photovoltage

コレクション : 国立国会図書館デジタルコレクション > デジタル化資料 > 雑誌

Japanese journal of applied physics. Part. 1, Regular papers, brief communications & review papers : JJAP

Japanese journal of applied physics. Part. 1, Regular papers, brief communications & review papers : JJAP 45 (3A), 1471-1476, 2006-03

Tokyo : Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physics