Barrier characteristics of ZrN films deposited by remote plasma-enhanced atomic layer deposition using tetrakis(diethylamino)zirconium precursor

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Barrier characteristics of ZrN films deposited by remote plasma enhanced atomic layer deposition using tetrakis diethylamino zirconium precursor

コレクション : 国立国会図書館デジタルコレクション > デジタル化資料 > 雑誌

Japanese journal of applied physics. Part. 1, Regular papers, brief communications & review papers : JJAP

Japanese journal of applied physics. Part. 1, Regular papers, brief communications & review papers : JJAP 46 (7A), 4085-4088, 2007-07

Tokyo : Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physics