Barrier characteristics of ZrN films deposited by remote plasma-enhanced atomic layer deposition using tetrakis(diethylamino)zirconium precursor

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  • Barrier characteristics of ZrN films deposited by remote plasma enhanced atomic layer deposition using tetrakis diethylamino zirconium precursor
Published
2007-07
DOI
  • 10.1143/jjap.46.4085
Publisher
Tokyo : Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physics

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資料形態 : テキストデータ プレーンテキスト
コレクション : 国立国会図書館デジタルコレクション > デジタル化資料 > 雑誌

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