The Photopolymer Science and Technology Award--Francis M.Houlihan,et al."A Commerially Viable 193 nm Single Layer Resist Platform"
Bibliographic Information
- Other Title
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- Photopolymer Science and Technology Awa
Search this article
Journal
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- Journal of photopolymer science and technology
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Journal of photopolymer science and technology 11 (1), 5-8, 1998
Chiba : The Society of Photopolymer Science and Technology
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Details 詳細情報について
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- CRID
- 1521136280404594816
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- NII Article ID
- 40005351748
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- NII Book ID
- AA11576862
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- ISSN
- 09149244
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- NDL BIB ID
- 4525848
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- Text Lang
- en
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- NDL Source Classification
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- ZP48(科学技術--印写工学)
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- Data Source
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- NDL
- CiNii Articles
