Effect of High-Pressure Inert Gas Annealing on AlON/Ge Gate Stacks

Details 詳細情報について

• CRID

  1521136280996486016

• NII Article ID

  40019424993

• NII Book ID

  AA12295133

• ISSN

  18820778

• NDL BIB ID

  023966283

• Web Site

  http://id.ndl.go.jp/bib/023966283

  https://ndlsearch.ndl.go.jp/books/R000000004-I023966283

• Text Lang

  en

• NDL Source Classification

  • ZM35(科学技術--物理学)

• Data Source

  • NDL Search
  • CiNii Articles