A High-Temperature Nitrogen Plasma Etching for Preserving Smooth and Stoichiometric GaN Surface

Details 詳細情報について

• CRID

  1522262180733318144

• NII Article ID

  10031174341

• NII Book ID

  AA12295133

• ISSN

  18820778

  18820786

  http://id.crossref.org/issn/18820786

• DOI

  10.7567/apex.6.056201

• NDL BIB ID

  024520442

• Web Site

  http://id.ndl.go.jp/bib/024520442

  https://ndlsearch.ndl.go.jp/books/R000000004-I024520442

  http://stacks.iop.org/1882-0786/6/i=5/a=056201/pdf

• Text Lang

  en

• NDL Source Classification

  • ZM35(科学技術--物理学)

• Data Source

  • NDL
  • Crossref
  • CiNii Articles