Effects of Thermal Treatments on the Trapping Properties of HfO₂ Films for Charge Trap Memories

Details 詳細情報について

• CRID

  1522825130142674944

• NII Article ID

  10030155154

• NII Book ID

  AA12295133

• ISSN

  18820778

• NDL BIB ID

  023454271

• Web Site

  http://id.ndl.go.jp/bib/023454271

  https://ndlsearch.ndl.go.jp/books/R000000004-I023454271

• Text Lang

  en

• NDL Source Classification

  • ZM35(科学技術--物理学)

• Data Source

  • NDL
  • CiNii Articles