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405 nm laser thermal lithography of 40 nm pattern using super resolution organic resist material
Bibliographic Information
- Other Title
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- 超解像有機レジスト材料により40nmパターンを描画可能な405nmレーザ熱リソグラフィ
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Journal
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- Fujifilm research & development = 富士フイルム研究報告
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Fujifilm research & development = 富士フイルム研究報告 (56), 56-58, 2011
南足柄 : 富士フイルムR&D統括本部足柄図書室
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Details 詳細情報について
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- CRID
- 1523106606029897600
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- NII Article ID
- 40018876295
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- NII Book ID
- AN10088082
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- ISSN
- 09151478
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- NDL BIB ID
- 11146992
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- Text Lang
- en
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- NDL Source Classification
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- ZP48(科学技術--印写工学)
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- Data Source
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- NDL Search
- CiNii Articles
