- 【Updated on May 12, 2025】 Integration of CiNii Dissertations and CiNii Books into CiNii Research
- Trial version of CiNii Research Automatic Translation feature is available on CiNii Labs
- Suspension and deletion of data provided by Nikkei BP
- Regarding the recording of “Research Data” and “Evidence Data”
405 nm laser thermal lithography of 40 nm pattern using super resolution organic resist material
Bibliographic Information
- Other Title
-
- 超解像有機レジスト材料により40nmパターンを描画可能な405nmレーザ熱リソグラフィ
Search this article
Journal
-
- Fujifilm research & development = 富士フイルム研究報告
-
Fujifilm research & development = 富士フイルム研究報告 (56), 56-58, 2011
南足柄 : 富士フイルムR&D統括本部足柄図書室
- Tweet
Details 詳細情報について
-
- CRID
- 1523106606029897600
-
- NII Article ID
- 40018876295
-
- NII Book ID
- AN10088082
-
- ISSN
- 09151478
-
- NDL BIB ID
- 11146992
-
- Text Lang
- en
-
- NDL Source Classification
-
- ZP48(科学技術--印写工学)
-
- Data Source
-
- NDL Search
- CiNii Articles
