Oxygen Dispersive Diffusion Induced Bias stress Instability in Thin Active Layer Amorphous ln-Ga-Zn-O Thin-Film Transistors

Details 詳細情報について

• CRID

  1523388079999499648

• NII Article ID

  10031159826

• NII Book ID

  AA12295133

• ISSN

  18820778

• NDL BIB ID

  024357147

• Web Site

  http://id.ndl.go.jp/bib/024357147

  https://ndlsearch.ndl.go.jp/books/R000000004-I024357147

• Text Lang

  en

• NDL Source Classification

  • ZM35(科学技術--物理学)

• Data Source

  • NDL Search
  • CiNii Articles