Thermodynamics of Development Process of Positive Resists in Binary Mixed Developer : Resist Material and Process :

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Description

The sensitivity of positive e-beam resists depends strongly on the development condition. We have found that a small amount of water in an organic developer enhances the resist dissolution rate resulting in development instability. The addition of polar solvents to a developer causes a large increase of the dissolution rate. The reason for this enhancement of the dissolution rate is explained by thermodynamic compatibility between the resist and the developer. It is shown that thermodynamic consideration of the development process is very useful to comprehend the dissolution characteristics of positive resists in binary mixed developers.

Journal

  • JJAP series

    JJAP series 4 143-146, 1991-01-31

    Japanese Journal of Applied Physics

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