Development of Aluminum sputter profile simulation including surface diffusion model

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Bibliographic Information

Other Title
  • 表面拡散モデルを含むアルミスパッタ形状シミュレーションシステムの開発

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Description

We have developed a practical aluminum sputter system which is composed of a trajectory calculation module using Monte Carlo(MC) method, a surface diffusion module, and a deposition profile module. In the system, the string model is utilized as the common data structure for simplifying interface. The surface diffusion model is found indispensable for aluminum. The adjusted surface diffusion coefficient with the activation energy of 12.4(kJ/mole) is found about one million times as large as the bulk at 573K.

Journal

  • Technical report of IEICE. VLD

    Technical report of IEICE. VLD 96 (258), 1-5, 1996-09-26

    The Institute of Electronics, Information and Communication Engineers

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Details 詳細情報について

  • CRID
    1570009752432026240
  • NII Article ID
    110003294372
  • NII Book ID
    AN10013323
  • Text Lang
    ja
  • Data Source
    • CiNii Articles

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