Electromigration test under high frequency pulsed current using on- chip pulse generator
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- Ito Shinya
- NEC Corporation
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- Noguchi Ko
- NEC Corporation
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- Horiuchi Tadahiko
- NEC Corporation
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- Okumura Koichiro
- NEC Corporation
Bibliographic Information
- Other Title
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- オンチップパルスジェネレータを用いた高周波パルス電流によるEM評価
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Description
The electromigration (EM) test using on-chip-generated pulsed current was performed.This test system makes the EM test at high frequencies (> 100 MHz) reliable because of little distortion of waveforms.The EM reliability of AlSiCu interconnect under uni- directional pulsed current (pulsed DC) stress was investigated from the point of its dependence on the pulse frequency and the duty factor,in 30 MHz -350 MHz frequency range.In this frequency range,the EM lifetime was found to be approximately constant,which was about 50 times longer at 0.4 duty than the constant DC lifetime.The EM lifetime showed a strong dependence on the duty factor,and the duty factor exponent was found to be 4.4±1.0.
Journal
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- Technical report of IEICE. SDM
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Technical report of IEICE. SDM 94 (180), 67-72, 1994-07-25
The Institute of Electronics, Information and Communication Engineers
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Details 詳細情報について
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- CRID
- 1570009752531169536
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- NII Article ID
- 110003310212
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- NII Book ID
- AN10013254
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- Text Lang
- ja
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- Data Source
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- CiNii Articles