HCI-Free Selective Epitaxial SiGe Growth by LPCVD for 80-GHz BiCMOS Production
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- KIYOTA Yukihiro
- Central Research Laboratory, Hitachi, Ltd.
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- UDO Tsutomu
- Hitachi ULSI Systems Co., Ltd.
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- HASHIMOTO Takashi
- Device Development Center, Hitachi, Ltd.
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- KODAMA Akihiro
- Musashino Office, Hitachi Device Engineering Co., Ltd.
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- SHIMAMOTO Hiromi
- Musashino Office, Hitachi Device Engineering Co., Ltd.
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- HAYAMI Reiko
- Central Research Laboratory, Hitachi, Ltd.
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- OHUE Eiji
- Central Research Laboratory, Hitachi, Ltd.
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- WASHIO Katsuyoshi
- Central Research Laboratory, Hitachi, Ltd.
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- Extended abstracts of the ... Conference on Solid State Devices and Materials
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Extended abstracts of the ... Conference on Solid State Devices and Materials 2001 372-373, 2001-09-25
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- CRID
- 1570291225232820352
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- NII論文ID
- 10015753210
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- NII書誌ID
- AA10777858
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- 本文言語コード
- en
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- データソース種別
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