Preparation and physical properties of polymethyl- and polyvinylsilsesquioxane thin films

8 References
  • ABE Yoshimoto
    Department of Industrial Chemistry, Faculty of Science and Technology, Science University of Tokyo
  • TAKAMURA Norihiro
    Department of Industrial Chemistry, Faculty of Science and Technology, Science University of Tokyo
  • KAGAYAMA Keiko
    Department of Industrial Chemistry, Faculty of Science and Technology, Science University of Tokyo
  • GUNJI Takahiro
    Department of Industrial Chemistry, Faculty of Science and Technology, Science University of Tokyo

Bibliographic Information

Other Title
  • ポリメチル及びポリビニルシルセスキオキサン薄膜の調製と物性

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Description

Polysilsesquioxanes with various molecular weights were prepared by acid-catalyzed hydrolytic polycondensation of trimethoxysilane RSi(OMe)_3 (R=Me, Vinyl) Flexible and thin free-standing films of thickness 0.02-0.10 mm were prepared from the polysiloxanes. The tensile strength of the films was dependent on the degree of condensation of siloxane linkage (T^3/(T^2+T^3)). Coating films of thickness 0.4-0.6μm were prepared by dip-coating of metal and ceramic board with an acetone-methanol solution of polysilsesquioxanes. The properties such as adhesion and hardness evaluated by JIS standard were dependent on the molecular weight and solubility parameter. The films were revealed to be thermally stable from the adhesion and hardness test up to 500℃.

Journal

  • Technical report of IEICE. OME

    Technical report of IEICE. OME 97 (34), 19-25, 1997-05-06

    The Institute of Electronics, Information and Communication Engineers

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Keywords

Details 詳細情報について

  • CRID
    1570572702489699584
  • NII Article ID
    110003300547
  • NII Book ID
    AN10013334
  • Text Lang
    ja
  • Data Source
    • CiNii Articles

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