A new diffusion algorithm during oxidation which can handle both Phosphorus Pile-up and Boron Segregation at Si-SiO2 interface

詳細情報 詳細情報について

• CRID

  1572261549965443712

• NII論文ID

  10013323076

• NII書誌ID

  AA00667933

• データソース種別

  • CiNii Articles