A superior TiN/TiSi_2 barrier layer by using sputter deposition from a TiN_<0.4> alloy target and subsequent RTN27:010★VLSI Technol. Symp. Dig.

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Details 詳細情報について

  • CRID
    1572824498905865984
  • NII Article ID
    10000013517
  • Data Source
    • CiNii Articles

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