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Fabrication of wide-head T-gate 0.2μm gate length using E beam lithography for MIMIC applications
Journal
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- IEEK autumn conference 1999
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IEEK autumn conference 1999 22 (2), 187-190, 1999
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Details 詳細情報について
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- CRID
- 1573105975474594816
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- NII Article ID
- 10022108957
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- Data Source
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- CiNii Articles