A new ionplating process for transparent electrically conductive indium tin oxide (ITO) films

5 References
  • AWAI Kiyoshi
    Sumitomo Heavy Industries, Ltd. PLANNING DEPARTMENT CORPOLATE TECHNOLOGY OPERATIONS GROUP

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Other Title
  • 透明導電膜(ITO)の新しい成膜装置

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Description

A new ionplating (URT-IP) process using an unique plasma beam control system for gradient- pressure type plasma source that generate highly dense arc plasma, which enables uniformly coating in large area. This technique has a powerful potential of high speed deposition of a variety of thin film materials. Particularly attractive attention is focused on the coating of transparent electrically conductive tin-doped indium oxide (ITO) films for flat panel displays (FPD). The prototype machine has demonstrated the attractive data, lower resistivity, lower substrate temperature and higher deposition rate compared to sputtering process, which has proved the competitiveness of the process in FPD applications. The first machine for commercial use in 1997 is intended to be the starter of replacing conventional machines based on sputtering system.

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Details 詳細情報について

  • CRID
    1573105977228374144
  • NII Article ID
    110003268562
  • NII Book ID
    AN10060775
  • Text Lang
    ja
  • Data Source
    • CiNii Articles

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