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Study of a cavity confined plasma as a debris-less and high conversion efficiency EUV source
Journal
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- 2nd Int. Workshop on EUV Lithography (San Francisco, October)
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2nd Int. Workshop on EUV Lithography (San Francisco, October) 2000
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Details 詳細情報について
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- CRID
- 1573387449951427072
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- NII Article ID
- 10012334392
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- Data Source
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- CiNii Articles