Evaluation of Activated Chemical Species Generated in RCA Cleaning Solution

7 References
  • TOZUKA Kiyotaka
    Department of Materials Science and Engineering, Faculty of Engineering Yamagata University
  • KATO Masayuki
    Department of Materials Science and Engineering, Faculty of Engineering Yamagata University
  • TODA Masayuki
    Department of Materials Science and Engineering, Faculty of Engineering Yamagata University
  • OHMI Tadahiro
    Department of Electronic Engineering, Faculty of Engineering Tohoku University

Bibliographic Information

Other Title
  • RCA洗浄溶液に生成する活性種の評価

Search this article

Description

RCA cleaning method proposed by W.kern et al. has been used empirically for wafer surface cleaning since 1970. However, there has been many uncertain problems in this cleaning method. In this study, the generated active chemical species in RCA cleaning solutions were measured and evaluated to develop the new cleaning technology. As a result, the formation of high reactive OH radical was found to be caused by Fenton reaction in RCA cleaning solutions. It is also revealed that the ratio of hydrogenperoxide to strong acid such as HF, H_2SO_4 and HCl in RCA cleaning solution does not affect on the formation of OH radical. Moreover, it is suggested that anode water of which pH value is controlled can be utilized in RCA cleaning solution instead of strong acid such as HF, H_2SO_4 and HCl.

Journal

  • Technical report of IEICE. SDM

    Technical report of IEICE. SDM 96 (359), 71-78, 1996-11-14

    The Institute of Electronics, Information and Communication Engineers

References(7)*help

See more

Keywords

Details 詳細情報について

  • CRID
    1573668927233423488
  • NII Article ID
    110003309575
  • NII Book ID
    AN10013254
  • Text Lang
    ja
  • Data Source
    • CiNii Articles

Report a problem

Back to top