Characteristics of Annular Illumination on Half Tone Phase Shift Mask

Bibliographic Information

Other Title
  • ハーフトーン位相差法における輪帯照明条件の効果

Search this article

Description

In the recent progress of optical lithography,the super resolution method has been the key technique to improve the resolution without loss of depth of focus(DOF).The half tone phase shift mask(HTM)is combined with annular illumination and effectively enhances the resolution.The effects of light transmittance of shade film of HTM and illumination conditions are analyzed to optimize this method.The transmittance of shade film and the annular condition are determined to be 5% and more than 0. 3 of sl-value as the optimum condition,respectively.These simulation results are verified in the i-line positive resist process and 2.5μm DOF is obtained for 0.3μm L, S patterns.

Journal

  • Technical report of IEICE. SDM

    Technical report of IEICE. SDM 94 (282), 1-6, 1994-10-19

    The Institute of Electronics, Information and Communication Engineers

Keywords

Details 詳細情報について

  • CRID
    1574231877181826176
  • NII Article ID
    110003310227
  • NII Book ID
    AN10013254
  • Text Lang
    ja
  • Data Source
    • CiNii Articles

Report a problem

Back to top